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Article type: Research Article
Authors: Shao, Shan-Shana | Yang, Fuqianb; * | Xuan, Fu-Zhena
Affiliations: [a] School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, China | [b] Department of Chemical and Materials Engineering, University of Kentucky, Lexington, KY, USA
Correspondence: [*] Corresponding authors: Fuqian Yang, Department of Chemical and Materials Engineering, University of Kentucky, Lexington, KY 40506, USA. E-mail: fyang0@engr.uky.edu; Fu-Zhen Xuan, School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, China. E-mail: fzxuan@ecust.edu.cn
Abstract: An analysis was made of the diffusional creep in polycrystalline materials when subjected to simultaneous action of tensile stress and electric current. Incorporating the contribution of electromigration to atomic diffusion in grain boundaries, the problem of grain boundary diffusion was solved. A simple relationship was derived between diffusional creep rate and local electric field intensity (current density). The results showed that electromigration can enhance the diffusional creep in polycrystalline materials.
Keywords: Electromigration, diffusion creep
DOI: 10.3233/JAE-2012-1583
Journal: International Journal of Applied Electromagnetics and Mechanics, vol. 40, no. 2, pp. 165-171, 2012
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