Magnetostriction and magnetic characteristics of giant magnetostrictive thin film

Issue title: Proceedings of the tenth International Symposium on Applied Electromagnetics and Mechanics ISEM-Tokyo

Article type: Research Article

Authors: Wakiwaka, Hiroyuki^{a; *} | Yamada, Yoji^a | Watanabe, Toshihiko^b | Umemoto, Yoshiyuki^b | Kiyomiya, Teruo^b | Makimura, Mika^c

Affiliations: [a] Graduate School of Science and Technology, Shinshu Univ., 4-17-1 Wakasato, Nagano-shi 380-8553, Japan | [b] FDK Corporation, 2281 Washizu, Kosai-shi 431-0495, Japan | [c] Industrial Research Institute of Nagano Prefecture, 1-18-1 Wakasato, Nagano-shi 380-0928, Japan

Correspondence: [*] Corresponding author: Hiroyuki Wakiwaka, Fax: +81 26 269 5190; E-mail: wakiwak@gipwc.shinshu-u.ac.jp

Abstract: Giant magnetostrictive thin films are suitable to develop new micro-sensors and micro-actuators due to their superior characteristics. In this paper, the influence on magnetostriction characteristic of magnetron sputtered film by sputtering condition is described. The thin film shows large magnetostriction in Tb composition 40 at %, in anneal temperature 300°C.

DOI: 10.3233/JAE-2002-419

Journal: International Journal of Applied Electromagnetics and Mechanics, vol. 14, no. 1-4, pp. 435-438, 2002