Searching for just a few words should be enough to get started. If you need to make more complex queries, use the tips below to guide you.
Issue title: International Conference on Fracture and Strength 2010 – From Physical to Holistic, Part 2
Article type: Research Article
Authors: Shiraiwa, Takayuki; | Enoki, Manabu
Affiliations: Department of Materials Engineering, The University of Tokyo, Tokyo, Japan
Note: [] Address for correspondence: T. Shiraiwa, Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan. E-mail: shiraiwa@rme.mm.t.u-tokyo.ac.jp.
Abstract: A new sensor called “smart stress-memory patch” which can measure the stress amplitude and the number of fatigue cycles and the maximum stress related to a structure subjected to fatigue loading for efficient structural health monitoring has been proposed. However, there are two problems in the real applications of smart patch. Firstly, when the sensor is adhered to the structure, the sensing property of smart patch may change because the restrained condition of the sensor would be intricately changed. Secondly, high-precision crack measurement of smart patch by optical microscope is too cumbersome in the real field. In this study, thin electrodeposited (ED) Cu specimen was prepared and attached to steel bar as a sensor of smart patch. The fatigue test was performed to examine the fatigue crack growth of the sensor attached to the structure. Furthermore, wireless devices using low power wireless modules have been developed for efficient crack measurements, and wireless devices results give close agreement with the results by microscope.
Keywords: Fatigue crack growth, finite element method, sensor, structural health monitoring
DOI: 10.3233/SFC-2011-0139
Journal: Strength, Fracture and Complexity, vol. 7, no. 2, pp. 205-214, 2011
IOS Press, Inc.
6751 Tepper Drive
Clifton, VA 20124
USA
Tel: +1 703 830 6300
Fax: +1 703 830 2300
sales@iospress.com
For editorial issues, like the status of your submitted paper or proposals, write to editorial@iospress.nl
IOS Press
Nieuwe Hemweg 6B
1013 BG Amsterdam
The Netherlands
Tel: +31 20 688 3355
Fax: +31 20 687 0091
info@iospress.nl
For editorial issues, permissions, book requests, submissions and proceedings, contact the Amsterdam office info@iospress.nl
Inspirees International (China Office)
Ciyunsi Beili 207(CapitaLand), Bld 1, 7-901
100025, Beijing
China
Free service line: 400 661 8717
Fax: +86 10 8446 7947
china@iospress.cn
For editorial issues, like the status of your submitted paper or proposals, write to editorial@iospress.nl
如果您在出版方面需要帮助或有任何建, 件至: editorial@iospress.nl