Characterization of a Multilayer Coated Laminar Reflection Grating at λ = 0.154 nm

Article type: Research Article

Authors: Puik, E. J. | van der Wiel, M. J. | Lambooy, P. | Verhoeven, J. | Christensen, F. E. | Padmore, H. A.

Affiliations: Association Euratom-FOM, FOM Institute for Plasma Physics Rijnhuizen, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands | FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands | Danish Space Research Institute, Lundtoftevej 7, DK 2800 Lyngby, Denmark | SERC Daresbury Laboratory, Warrington, WA4 4AD, United Kingdom

Abstract: A laminar grating of 1200 1/mm was coated with an x-ray reflecting multilayer coating. The multilayer coating consisted of 41 alternating layers of ReW and C having a period of 2.3 nm. In this paper we report on diffraction measurements of the coated grating at the CuKα emission line. We describe its reflection behavior using a simple theoretical model and derive two diffraction conditions, corresponding to the grating relation and the Bragg law, for which peak intensities are to be observed. We find that grating order efficiencies are modulated by the multilayer reflection.

DOI: 10.3233/XST-1991-3103

Journal: Journal of X-Ray Science and Technology, vol. 3, no. 1, pp. 19-34, 1991