Investigation of polishing for inner capillary walls by MCF flow method

Issue title: Selected Papers from the 14th International Symposium on Applied Electromagnetics and Mechanics (ISEM 2009), Part II

Article type: Research Article

Authors: Nishida, Hitoshi^{a; *} | Shimada, Kunio^b | Ido, Yasushi^c

Affiliations: [a] Toyama National College of Technology, 13 Hongo, Toyama, 939-8630, Japan | [b] Fukushima University, 1 Kanayagawa, Fukushima, 960-1296, Japan | [c] Nagoya Institute of Technology, Goki-cho, Showa-ku, Nagoya, 466-8555, Japan

Correspondence: [*] Corresponding author. Tel.: +81 (0) 76 493 5439; Fax: +81 (0) 76 492 3859; E-mail: nishida@toyama-nct.ac.jp

Abstract: We investigated the effect of the flow direction of abrasive particles and magnetic clusters on polishing of an inner capillary wall by magnetic compound fluid (MCF) flow. We used an experimental system for polishing inner capillary walls by controlling the MCF flow rate and the rotational speed of the magnetic field. We clarified the relationship between the traces left in the capillary and the flow direction of the abrasive particles and the magnetic clusters, which influences the polishing.

Keywords: Polishing, inner capillary wall, magnetic compound fluid, flow rate, magnetic field, magnetic cluster

DOI: 10.3233/JAE-2010-1301

Journal: International Journal of Applied Electromagnetics and Mechanics, vol. 33, no. 3-4, pp. 1685-1690, 2010