Searching for just a few words should be enough to get started. If you need to make more complex queries, use the tips below to guide you.
Article type: Research Article
Authors: Heo, Yujin | Jung, Hyunwoo | Shin, Sehyun
Affiliations: School of Mechanical Engineering, Korea University, Seoul, Korea | Department of New Materials, SUNY at Stony Brook, NY, USA
Note: [] Corresponding author: Sehyun Shin, PhD, Professor and Director, Green Nanotechnology Center, School of Mechanical Engineering, Korea University, Seoul, Korea. E-mail: lexerdshin@korea.ac.kr
Abstract: Red blood cell (RBC) deformability is greatly affected by the osmolality, and maximum deformability, which is determined as maximal elongation index (EImax), is usually observed in isotonic conditions at high shear stresses (>20 Pa). Therefore, we examined osmotic RBC deformability over a range of shear stresses (0.5–20 Pa). We found that the RBC deformability at low shear stresses (1–3 Pa) was maximum in hypotonic conditions (225–250 mOsm/kg H2O), which is slightly lower than the normal range of osmolality in plasma (290–310 mOsm/kg H2O). The phenomenon that Omax (the osmolality at EImax) is dependent on applied shear stress could play an important role in microcirculation in which osmolality varies widely.
Keywords: RBC, deformability, osmolality, shear stress, in vivo
DOI: 10.3233/CH-131761
Journal: Clinical Hemorheology and Microcirculation, vol. 59, no. 3, pp. 211-218, 2015
IOS Press, Inc.
6751 Tepper Drive
Clifton, VA 20124
USA
Tel: +1 703 830 6300
Fax: +1 703 830 2300
sales@iospress.com
For editorial issues, like the status of your submitted paper or proposals, write to editorial@iospress.nl
IOS Press
Nieuwe Hemweg 6B
1013 BG Amsterdam
The Netherlands
Tel: +31 20 688 3355
Fax: +31 20 687 0091
info@iospress.nl
For editorial issues, permissions, book requests, submissions and proceedings, contact the Amsterdam office info@iospress.nl
Inspirees International (China Office)
Ciyunsi Beili 207(CapitaLand), Bld 1, 7-901
100025, Beijing
China
Free service line: 400 661 8717
Fax: +86 10 8446 7947
china@iospress.cn
For editorial issues, like the status of your submitted paper or proposals, write to editorial@iospress.nl
如果您在出版方面需要帮助或有任何建, 件至: editorial@iospress.nl