Searching for just a few words should be enough to get started. If you need to make more complex queries, use the tips below to guide you.
Article type: Research Article
Authors: Akagawa, Eiki | Ookawa, Keiko | Ohshima, Norio;
Affiliations: University of Tsukuba Graduate School of Comprehensive Human Sciences, Japan | Department of Biomedical Engineering, Institute of Basic Medical Sciences, University of Tsukuba, Japan
Note: [] Address for correspondence: Norio Ohshima, PhD, Department of Biomedical Engineering, Institute of Basic Medical Sciences, University of Tsukuba, 1‐1‐1 Tennoudai, Tsukuba Science City, Ibaraki Prefecture 305‐8575, Japan. Tel.: +81 29 853 3210; Fax: +81 29 853 3495; E‐mail: ohshima@md.tsukuba.ac.jp.
Abstract: Neointimal hyperplasia influenced by intravascular hemodynamics is considered partly responsible for restenosis after endovascular stenting. To evaluate the effect of stent configuration on fluid flow behavior, we visualized flow near stents, and measured the proliferation of cultured endothelial cells (ECs). A single‐coil stent (coil pitch; CP=2.5, 5, or 10 mm) was inserted into a glass tube and perfused at 30–90 ml/min, while the flow pattern was determined by particle imaging velocimetry. The reduction of the flow velocity near the wall was correlated with the decrease in the coil interval of the stent. In perfusion cultures with stents, the proliferation of ECs was influenced by the local flow velocity distribution. When a stent with a CP value of 10 mm was used, the doubling time of ECs was 30.7 h, while the doubling time was 38.5 h when the CP was 5 mm. The doubling time of ECs was shorter at sites upstream of the stent wire where the velocity was higher than downstream of the wire. In conclusion, a single‐coil stent can be used to modify hemodynamic factors, suggesting that improved stent design may facilitate rapid endothelialization after stent implantation.
Keywords: Restenosis, wall shear stress, coil pitch, perfusion culture, porcine aortic endothelial cell
Journal: Biorheology, vol. 41, no. 6, pp. 665-680, 2004
IOS Press, Inc.
6751 Tepper Drive
Clifton, VA 20124
USA
Tel: +1 703 830 6300
Fax: +1 703 830 2300
sales@iospress.com
For editorial issues, like the status of your submitted paper or proposals, write to editorial@iospress.nl
IOS Press
Nieuwe Hemweg 6B
1013 BG Amsterdam
The Netherlands
Tel: +31 20 688 3355
Fax: +31 20 687 0091
info@iospress.nl
For editorial issues, permissions, book requests, submissions and proceedings, contact the Amsterdam office info@iospress.nl
Inspirees International (China Office)
Ciyunsi Beili 207(CapitaLand), Bld 1, 7-901
100025, Beijing
China
Free service line: 400 661 8717
Fax: +86 10 8446 7947
china@iospress.cn
For editorial issues, like the status of your submitted paper or proposals, write to editorial@iospress.nl
如果您在出版方面需要帮助或有任何建, 件至: editorial@iospress.nl